发明名称 KOMPOSITMATERIAL UND DESSEN VERWENDUNG
摘要 It is an object of the present invention to provide a composite material having low thermal expansivity, high thermal conductivity, and good plastic workability, which is applied to semiconductor devices and many other uses. The composite material is composed of metal and inorganic particles having a smaller coefficient of thermal expansion than said metal. It is characterized in that said inorganic particles disperse in such a way that 95% or more of them (in terms of their area in cross-section) form aggregates of complex configuration joining together. The composite material contains 20-80 vol% of copper oxide, with the remainder being copper. It has a coefficient of thermal expansion of 5 x 10<-6> to 14 x 10<-6>/ DEG C and thermal conductivity of 30-325 W/m.K in the range of room temperature to 300 DEG C. It is suitable for the radiator plate of semiconductor devices and the dielectric plate of electrostatic attractors. <IMAGE>
申请公布号 DE69833788(D1) 申请公布日期 2006.05.04
申请号 DE1998633788 申请日期 1998.12.07
申请人 HITACHI, LTD. 发明人 KONDO, HITACHI RESEARCH LABORATORY;KANEDA, HITACHI RESEARCH LABORATORY;AONO, HITACHI RESEARCH LABORATORY;ABE, HITACHI RESEARCH LABORATORY;INGAKI, HITACHI RESEARCH LABORATORY;SAITO, HITACHI RESEARCH LABORATORY;KOIKE, HITACHI RESEARCH LABORATORY;ARAKAWA, HITACHI KYOWA ENGINEERING CO.
分类号 C22C1/05;B22F1/00;C04B35/45;C22C1/10;C22C9/00;C22C29/00;C22C29/12;C22C32/00;H01L21/68;H01L23/373 主分类号 C22C1/05
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