Polymerizable fluorinated compound, making method, polymer, resist composition and patterning process

摘要

A polymerizable fluorinated compound having formula (2a) or (2b) wherein R¹ and R² are H or C₁-C₂₀ alkyl or fluoroalkyl, R³ is H, F or C₁-C₄ alkyl or fluoroalkyl, and R is H or a protective group is polymerized into a fluorinated polymer which is used as a base polymer to formulate a resist composition having transparency to laser light of wavelength<=300 nm, alkali development amenability, and dry etch resistance.