发明名称 Semiconductor laser device and process for preparing the same
摘要 Provided are a high output semiconductor laser device that is capable of inhibiting changes in far-field horizontal (FFH) due to increased output thereof, and a process for preparing the same. The semiconductor laser device in accordance with the present invention comprises a first clad layer of a first conductivity type formed on a substrate; an active layer formed on the first clad layer; and a second clad layer of a second conductivity type formed on the active layer and including an upper region having a ridge structure, wherein the second clad layer has at least one high refractivity layer inserted into the ridge structure, the high refractivity layer having a higher refractive index than the second clad layer.
申请公布号 US2006093003(A1) 申请公布日期 2006.05.04
申请号 US20050151552 申请日期 2005.06.14
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 MOON KI W.;PARK JONG I.;KIM YU S.;OH HYE R.
分类号 H01S5/00 主分类号 H01S5/00
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