System and method for supplying precursor gases to an implantation tool

摘要

An improved supply system for an ion source of an ion implantation tool and a method of operating the same is provided. By using a buffer volume between an SDS gas bottle and the ion source, stability of the gas flow to the ion source is significantly enhanced, while at the same time nearly all of the gas contents in the gas bottle may be available during operation of the ion implantation tool.