| 发明名称 |
Method for constraining a thin pattern |
| 摘要 |
The invention relates to a method for straining or deforming a pattern or a thin layer ( 24 ), starting from an initial component comprising the said thin layer and a prestressed layer ( 20 ), this method comprising: an etching step of the prestressed layer, perpendicular to its surface.
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| 申请公布号 |
US2006091105(A1) |
申请公布日期 |
2006.05.04 |
| 申请号 |
US20050172945 |
申请日期 |
2005.07.05 |
| 申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE |
发明人 |
BARBE JEAN-CHARLES;ERNST THOMAS |
| 分类号 |
B44C1/22;C23F1/00;H01L29/78 |
主分类号 |
B44C1/22 |
| 代理机构 |
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