发明名称 |
High-power dielectric seasoning for stable wafer-to-wafer thickness uniformity of dielectric CVD films |
摘要 |
A method for seasoning a deposition chamber wherein the chamber components and walls are densely coated with a material that does not contain carbon prior to deposition of an organo-silicon material on a substrate. An optional carbon-containing layer may be deposited therebetween. A chamber cleaning method using low energy plasma and low pressure to remove residue from internal chamber surfaces is provided and may be combined with the seasoning process.
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申请公布号 |
US2006093756(A1) |
申请公布日期 |
2006.05.04 |
申请号 |
US20040981430 |
申请日期 |
2004.11.03 |
申请人 |
RAJAGOPALAN NAGARAJAN;XIA LI-QUN;BALSEANU MIHAELA;NOWAK THOMAS;SHAH RANJANA;XU HUIWEN;PETERSON CHAD;WITTY DEREK R;M SAAD HICHEM |
发明人 |
RAJAGOPALAN NAGARAJAN;XIA LI-QUN;BALSEANU MIHAELA;NOWAK THOMAS;SHAH RANJANA;XU HUIWEN;PETERSON CHAD;WITTY DEREK R.;M'SAAD HICHEM |
分类号 |
B05D1/36 |
主分类号 |
B05D1/36 |
代理机构 |
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