EXPOSURE METHOD AND APPARATUS

摘要

When a pattern is formed by exposure in a recording medium such as printed wiring board on which a photosensitive layer such as a resist layer is arranged, removal failure or easy separation of the photosensitive layer is prevented while maintaining adhesion of the photosensitive layer. Specifically, when a wiring pattern is exposed into a resist layer which is arranged on a substrate using an exposure apparatus (3), the irradiation energy of light illuminating the edge region of the wiring pattern is set larger than the irradiation energy of light illuminating regions other than the edge region.