<p>The invention relates to microelectronic engineering and can be used for producing storing devices. The inventive memory cell is provided with a memory element comprising a first electrode, a second electrode and a dielectric layer disposed between said electrodes, wherein said dielectric layer is made from integrated in a stack N individual uniform films having substantially equal thickness d<80 mkm and N>1. The inventive embodiment of the dielectric layer disposed between the electrodes makes it possible to increase the chargeability thereof and to keep electric charges between electrodes over a long-term period.</p>
申请公布号
WO2006046884(A1)
申请公布日期
2006.05.04
申请号
WO2005RU00228
申请日期
2005.04.27
申请人
KARTASHOV, EDUARD MIKHAILOVICH;TSOI, BRONYA;LAVRENTIEV, VLADIMIR VLADIMIROVICH;SHEVELEV, VALENTIN VLADIMIROVICH
发明人
TSOI, BRONYA;LAVRENTIEV, VLADIMIR VLADIMIROVICH;KARTASHOV, EDUARD MIKHAILOVICH;SHEVELEV, VALENTIN VLADIMIROVICH