发明名称 NEGATIVE PHOTOSENSITIVE COMPOSITION AND NEGATIVE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
摘要 There are provided a negative-working photosensitive composition which can be cured by infrared rays and is less likely to suffer polymerization inhibition by oxygen during radical polymerization, and also exhibits high adhesion with a metal, and a negative-working photosensitive lithographic printing plate which is capable of directly forming images by irradiation with infrared rays from a solid or semiconductor laser based on digital signals, and also has high sensitivity and excellent printing durability. The negative-working photosensitive composition contains an infrared absorber (A), an organoboron compound (B) which functions as a polymerization initiator by using in combination with the infrared absorber (A), a compound having a polymerizable unsaturated group (C) and a diazo resin (D), and the negative-working photosensitive lithographic printing plate comprises a support, and a photosensitive layer containing the negative-working photosensitive composition formed on the support.
申请公布号 EP1653281(A1) 申请公布日期 2006.05.03
申请号 EP20040746295 申请日期 2004.06.17
申请人 KODAK GRAPHIC COMMUNICATIONS JAPAN LTD. 发明人 SAKURAI, HIDEO;HAYAKAWA, EIJI
分类号 B41M5/36;B41C1/10;G03F7/021;G03F7/029;(IPC1-7):G03F7/004 主分类号 B41M5/36
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