发明名称 |
NEGATIVE PHOTOSENSITIVE COMPOSITION AND NEGATIVE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE |
摘要 |
There are provided a negative-working photosensitive composition which can be cured by infrared rays and is less likely to suffer polymerization inhibition by oxygen during radical polymerization, and also exhibits high adhesion with a metal, and a negative-working photosensitive lithographic printing plate which is capable of directly forming images by irradiation with infrared rays from a solid or semiconductor laser based on digital signals, and also has high sensitivity and excellent printing durability. The negative-working photosensitive composition contains an infrared absorber (A), an organoboron compound (B) which functions as a polymerization initiator by using in combination with the infrared absorber (A), a compound having a polymerizable unsaturated group (C) and a diazo resin (D), and the negative-working photosensitive lithographic printing plate comprises a support, and a photosensitive layer containing the negative-working photosensitive composition formed on the support.
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申请公布号 |
EP1653281(A1) |
申请公布日期 |
2006.05.03 |
申请号 |
EP20040746295 |
申请日期 |
2004.06.17 |
申请人 |
KODAK GRAPHIC COMMUNICATIONS JAPAN LTD. |
发明人 |
SAKURAI, HIDEO;HAYAKAWA, EIJI |
分类号 |
B41M5/36;B41C1/10;G03F7/021;G03F7/029;(IPC1-7):G03F7/004 |
主分类号 |
B41M5/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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