| 发明名称 |
PATTERN EXPOSING SYSTEM AND PATTERN EXPOSING METHOD |
| 摘要 |
A pattern exposing apparatus includes a plurality of optical units, a control section sending to each optical unit a signal for controlling an exposure pattern width to be exposed according to pattern data concerning a target exposure pattern, and a compensation operation memory 24 for compensating the control signal
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| 申请公布号 |
EP1653280(A1) |
申请公布日期 |
2006.05.03 |
| 申请号 |
EP20040745543 |
申请日期 |
2004.06.03 |
| 申请人 |
SHARP KABUSHIKI KAISHA |
发明人 |
KOKUBO, FUMIO;NISHIKAWA, MASAYUKI |
| 分类号 |
G03F7/00;G03F7/20;G03F9/00;G06K15/00;H01L21/027;H01L21/30;(IPC1-7):G03F7/00 |
主分类号 |
G03F7/00 |
| 代理机构 |
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代理人 |
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