Methode for depositing atomic layer and ALD system having separate jet orifice for spouting purge-gas,申请号KR20040030692-传众专利搜索

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发明名称	Methode for depositing atomic layer and ALD system having separate jet orifice for spouting purge-gas
摘要
申请公布号	KR100574569(B1)	申请公布日期	2006.05.03
申请号	KR20040030692	申请日期	2004.04.30
申请人		发明人
分类号	H01L21/205;C23C16/00;C23C16/42;C23C16/455;C23C16/56	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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