发明名称 |
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND SUBSTRATE HOLDING APPARATUS |
摘要 |
A substrate processing apparatus and a substrate processing method is provided for performing a chemical liquid process, a cleaning process, a drying process, or the like while rotating a substrate such as a semiconductor wafer or a liquid crystal substrate. A substrate holding apparatus is provided for holding and rotating a substrate. The substrate processing apparatus for processing a substrate while supplying a fluid to the substrate includes a substrate holder for holding and rotating the substrate, and a holder suction unit for sucking the fluid from the substrate holder. The substrate holding apparatus includes a plurality of rollers which are brought into contact with an edge portion of a substrate so as to hold and rotate the substrate, and at least one moving mechanism for moving the rollers. |
申请公布号 |
EP1652222(A1) |
申请公布日期 |
2006.05.03 |
申请号 |
EP20040771154 |
申请日期 |
2004.07.28 |
申请人 |
EBARA CORPORATION |
发明人 |
YAMADA, KAORU;SAITO, TAKAYUKI;YABE, SUMIO;ITO, KENYA;KAMEZAWA, MASAYUKI;SEKI, MASAYA;KATAKABE, ICHIRO;INOUE, YUKI |
分类号 |
B08B1/04;B08B3/02;C23C18/16;C25D7/12;H01L21/00;H01L21/304;H01L21/306;(IPC1-7):H01L21/304 |
主分类号 |
B08B1/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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