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发明名称
PLASMA REACTION CHAMBER HAVING MULTI ARRAYED VACUUM CHAMBER
摘要
申请公布号
KR100576093(B1)
申请公布日期
2006.05.03
申请号
KR20040017417
申请日期
2004.03.15
申请人
发明人
分类号
H01L21/02
主分类号
H01L21/02
代理机构
代理人
主权项
地址
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