发明名称 |
Apparatus, method, and program for designing a mask and method for fabricating semiconductor devices |
摘要 |
An apparatus for designing a mask that enables quick mask design. A generation unit generates data regarding a mask pattern formed on a mask from design data regarding an exposure pattern transferred onto a semiconductor substrate. A calculation unit calculates an exposure pattern transferred onto the semiconductor substrate by applying a filter having a predetermined characteristic to the data regarding a mask pattern generated by the generation unit. A correction unit corrects the data regarding a mask pattern generated by the generation unit by comparing the exposure pattern calculated by the calculation unit and the design data. |
申请公布号 |
US7039889(B2) |
申请公布日期 |
2006.05.02 |
申请号 |
US20030379904 |
申请日期 |
2003.03.06 |
申请人 |
FUJITSU LIMITED |
发明人 |
TAKAHASHI KAZUHIKO;MINEMURA MASAHIKO;SAKURAI MITSUO;SUGAWA KAZUYA |
分类号 |
G03F1/08;G06F17/50;G03F1/00;G03F1/14;G03F1/36;G03F1/68;G03F1/70;H01L21/027 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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