METHOD OF FORMING WELL REGION IN SEMICONDUCTOR DEVICE,申请号KR20040085426-传众专利搜索

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发明名称	METHOD OF FORMING WELL REGION IN SEMICONDUCTOR DEVICE
摘要
申请公布号	KR20060036543(A)	申请公布日期	2006.05.02
申请号	KR20040085426	申请日期	2004.10.25
申请人	HYNIX SEMICONDUCTOR INC.	发明人	KWAK, NOH YEAL
分类号	H01L27/115;H01L21/8247;H01L29/78	主分类号	H01L27/115
代理机构		代理人
主权项
地址

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