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发明名称
凸块制程与电镀制程
摘要
一种凸块制程与电镀制程,其中凸块制程包括下列步骤:提供一晶圆,晶圆上具有多个焊垫;在晶圆上形成一光阻层,并形成多个开口于光阻层中,且每一开口显露焊垫其中之一;在开口内之焊垫上形成多个第一合金块;在第一合金块上形成多个第二合金块;最后,去除光阻层。此种凸块制程与电镀制程能够形成材质均匀的合金凸块。
申请公布号
TW200614473
申请公布日期
2006.05.01
申请号
TW093132118
申请日期
2004.10.22
申请人
日月光半导体制造股份有限公司
发明人
黄敏龙
分类号
H01L23/48
主分类号
H01L23/48
代理机构
代理人
詹铭文;萧锡清
主权项
地址
高雄市楠梓加工出口区经三路26号
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