首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
FINE PATTERNING METHOD OF METAL LAYER
摘要
申请公布号
KR100577691(B1)
申请公布日期
2006.05.01
申请号
KR20050008544
申请日期
2005.01.31
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
HA, BYEOUNG JU;KIM, KYU SIK;HONG, SEOG WOO
分类号
H01L21/306;B81B7/02;H01L21/28
主分类号
H01L21/306
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Method of manufacturing a semiconductor component, and semiconductor component formed thereby
Method for fabricating semiconductor devices having silicided electrodes
Memory circuit having a controllable output drive
Breaking read barrier to apply optimizations
Systems and methods for improving search quality
Phototherapy system and device
Device-to-lead terminal connector for implantable tissue stimulators
Thermoplastic composition and products made therefrom
Analysis method about relationship of beating signal and heart function
Polymerizable composition for optical articles
Stain resistant grout
Reagents and method for spatio-temporal control of gene expression by illumination
Methods for treating and preventing insulin resistance and related disorders
Pigment epithelium derived factor from human plasma and methods of use thereof
Cysteine protease inhibitor
Coloured soda-lime glass
Predictive method and apparatus for antenna selection in a wireless communication system
Instruments for detecting low-molecular weight substance
Method and a system for detecting and optinally isolating a rare event particle
Use of acid stable protease in animal feed