| 摘要 |
<p>Subject of the invention is a device for generating highly displaced plasma with a high concentration of atoms featuring weak ionisation. The device is based on a plasma reactor, which provides a high level dissociation of gas within the plasma by high-frequency induction of electrical discharge and the correct selection of material types. For providing a high level dissociation of gas, the recombination factors of the materials, which the plasma reactor is built from are quite important. It is optimised for the individual types of electric discharge in gas, individual parameters like for example reactor temperature, partial gas pressure within the reactor, electric discharge induction frequency, power of electric discharge, type of generating, mixture of gas with inert gases etc. For generating larger quantities of neutral atoms within the gas plasma, the inductively connected radio-frequency electrode-free electric discharge has proven very good results.</p> |
