| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for fine structuring a plate glass base body to a high quality structure having a large depth of the structure and a more smaller dimension of the structure at an etching speed as high as possible. SOLUTION: In the method, (a) a step of coating at least one structured mask layer on a base body surface of the plate glass base body, (b) a step of forming an etching gas mixture by mixing a chemical etching gas with at least one kind of a rare gas in a mixing ratio of the chemical etching gas to at least one kind of the rare gas in (2:1) to (6:1) and (c) a step of performing a chemically reactive ion etching treatment so that the base body surface on which at least one layer is coated with the structured mask layer is exposed to the etching gas mixture are included, and a ratio of a sputter etching generated at the ion etching treatment is remarkably increased by the presence of at least one kind of the rare gas in the etching gas mixture, but the most part of the etching gas mixture is formed by the chemical etching gas. COPYRIGHT: (C)2006,JPO&NCIPI
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