发明名称 |
Composition for coating over a photoresist pattern |
摘要 |
The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing amino group. The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.
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申请公布号 |
US2006088788(A1) |
申请公布日期 |
2006.04.27 |
申请号 |
US20040973633 |
申请日期 |
2004.10.26 |
申请人 |
KUDO TAKANORI;PADMANABAN MUNIRATHNA;DAMMEL RALPH R |
发明人 |
KUDO TAKANORI;PADMANABAN MUNIRATHNA;DAMMEL RALPH R. |
分类号 |
G03C5/00 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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