| 摘要 |
PROBLEM TO BE SOLVED: To provide a removing liquid which selectively removes a copper deteriorated layer containing copper oxide and/or copper oxide damaged by dry etching and/or ashing while suppressing the corrosion of copper. SOLUTION: The residue removing liquid of the copper deteriorated layer contains copper oxide damaged by dry etching and/or ashing consisting of monocarboxylic acid and water. COPYRIGHT: (C)2006,JPO&NCIPI
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