| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device capable of carrying out an accurate exposure processing allowing liquid to be appropriately held between a projection optical system and a substrate. <P>SOLUTION: An exposure device forms a liquid immersion region of liquid LQ between a projection optical system PL and a substrate P and exposes the substrate P via the projection optical system PL and the liquid LQ of the liquid immersion region. The exposure device comprises a nozzle component 70 having at least one of a supply port 12 for supplying the liquid LQ and a collection port 22 for collecting the liquid LQ, and a nozzle adjustment mechanism 80 for adjusting at least one of the position and the posture of the nozzle component 70 according to the position and the posture of the substrate P. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
