发明名称 SHADOW MASK
摘要 PROBLEM TO BE SOLVED: To provide a shadow mask capable of preventing an electron beam, having passed through a through-hole of a slot from being blocked by a front-side hole part as much as possible, even when the incident angle of the electron beam becomes large. SOLUTION: This shadow mask 21 is constituted, arranging multiple through-holes 31, each communicating with a nearly oblong rear-side hole part 33 and a nearly oblong front-side hole part 32 in the horizontal direction X and the vertical direction Y of a mask body 22. At least the front-side hole parts, formed in an area between the horizontal axis 24 passing through the center 28 of a mask body 22 and two diagonal axes 26 and 27 are so structured that a pair of upper and lower sides 32c and 32d forming the outline of each of the front-side hole parts are formed in the range of±10°, with respect to an angleαformed with the center 28 as the starting point of the mask body 22 and the horizontal axis. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006114381(A) 申请公布日期 2006.04.27
申请号 JP20040301630 申请日期 2004.10.15
申请人 DAINIPPON PRINTING CO LTD 发明人 HIDESHIMA TAKAFUMI;OKA HIROKI
分类号 H01J29/07 主分类号 H01J29/07
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