发明名称 |
METHOD AND APPARATUS FOR ETCH ENDPOINT DETECTION |
摘要 |
Broadly speaking, an invention is provided for monitoring a plasma optical emission. More specifically, the present invention provides a method for monitoring the plasma optical emission through a variable aperture to detect an endpoint of a plasma etching process without interferences that could lead to false endpoint calls. The method includes collecting optical emission data from a plasma through an aperture defined by moveable members. The moveable members are capable of varying a configuration of the aperture. The method also includes holding the moveable members at a particular time to cause the aperture to maintain a fixed configuration. The method further includes detecting a specific perturbation in the plasma optical emission while holding the moveable members.
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申请公布号 |
US2006087644(A1) |
申请公布日期 |
2006.04.27 |
申请号 |
US20030696628 |
申请日期 |
2003.10.28 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
MCMILLIN BRIAN K.;DASSAPA FRANCOIS C. |
分类号 |
G01N21/00;G01J3/02;G01J3/30;G01J3/443;G01N21/68;H01L |
主分类号 |
G01N21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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