| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for forming an antireflection film of uniform film thickness on the surface of a base material, having a curved surface or an inclined surface at a low cost without going through the intermediary of a vacuum process. <P>SOLUTION: In the method for forming the antireflection film of uniform film thickness on the base material, by adhering an atomized application liquid onto the base material having the curved surface or the inclined surface, the application liquid is compounded with a surfactant. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
