发明名称 SOLUTION FOR FORMING SILICA-BASED FILM
摘要 PROBLEM TO BE SOLVED: To provide a solution for forming silica-based film, capable of forming the silica-based film having hardness similar to that of molten glass by a sol-gel method. SOLUTION: This solution for forming the silica-based film containing a silicon alkoxide, a strong acid, water and an alcohol is characterized in that the concentration of the silicon alkoxide is >3 and <9 mass% expressed by the SiO<SB>2</SB>concentration on converting the silicon atoms contained in the silicon alkoxide to those of the SiO<SB>2</SB>, the number of moles of the water is≥4 and≤10 folds of the total number of moles of the silicon atoms contained in the silicon alkoxide, and the concentration of the strong acid is 0.001-0.2 mol/kg range expressed by the mass molar concentration of proton on assuming that the proton completely dissociates from the strong acid. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006111851(A) 申请公布日期 2006.04.27
申请号 JP20050103614 申请日期 2005.03.31
申请人 NIPPON SHEET GLASS CO LTD 发明人 KAMIYA KAZUTAKA;SASAKI TERUYUKI;IGUCHI KAZUYUKI
分类号 C09D1/00;C03C17/25;C09D5/24;C09D183/02;C09D183/04 主分类号 C09D1/00
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