发明名称 SHADOW MASK
摘要 PROBLEM TO BE SOLVED: To provide a shadow mask, having a slot structure capable of minimizing defects of an electron beam and of landing a beam spot of a predetermined size and shape, on the phosphor of a cathode-ray tube. SOLUTION: This shadow mask is constituted, arranging multiple through-holes 11, each communicating with a nearly oblong rear-side hole part 21 and a nearly oblong front-side hole part 22 in the horizontal direction X and the vertical direction Y of a mask body. The shadow mask is so structured that at least the through-hole 11, positioned at the peripheral part of a horizontal axis passing through the center of the mask body and in the peripheral part of a diagonal axis passing through its center, has a projecting space part 25 projecting in the direction of a bridge part 23 interposed in the vertical direction Y between the through-holes to expand the plan-view shape of the through-holes 11; and the projecting space part 25 is expanded so as to be a tapered shape, by using the side of the vertical axis passing the center of the mask body as a projection start end. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006114302(A) 申请公布日期 2006.04.27
申请号 JP20040299642 申请日期 2004.10.14
申请人 DAINIPPON PRINTING CO LTD 发明人 HIDESHIMA TAKAFUMI;ANZAI YUJI
分类号 H01J29/07 主分类号 H01J29/07
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