发明名称 |
METHOD FOR MANUFACTURING A SILICON EPITAXIAL WAFER |
摘要 |
In a vapor phase growth apparatus for performing a vapor phase growth of a silicon epitaxial layer on a main surface of a silicon single crystal substrate while heating the silicon single crystal substrate placed on a pocket formed on a susceptor, from both sides, the pocket has an outer peripheral side part which supports a rear surface of the silicon single crystal substrate and an inner peripheral side part which is kept in a state of being more recessed than the outer peripheral side part in the inside of the outer peripheral side part, and the susceptor has a warped inverted U-shaped longitudinal sectional shape.
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申请公布号 |
EP1650788(A1) |
申请公布日期 |
2006.04.26 |
申请号 |
EP20040729522 |
申请日期 |
2004.04.26 |
申请人 |
SHIN-ETSU HANDOTAI CO., LTD. |
发明人 |
KANAYA, KOICHI;OTSUKA, TORU;KANNO, TAKAO |
分类号 |
C23C16/24;C23C16/458;C30B25/12;C30B29/06;H01L21/205;H01L21/683;H01L21/687;(IPC1-7):H01L21/205;H01L21/31;H01L21/68 |
主分类号 |
C23C16/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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