发明名称 |
SILICON CRYSTALLIZATION USING SELF-ASSEMBLED MONOLAYERS |
摘要 |
A display device comprises a substrate having a layer of crystalline or polycrystalline semiconductor material disposed over the substrate, wherein the substrate has a strain point that is lower than a forming temperature of the layer. The crystalline or polycrystalline material is fabricated by a method that includes providing a self-assembled monolayer (SAM) over the substrate, depositing a layer of material over the SAM, and substantially crystallizing the layer. |
申请公布号 |
EP1649499(A2) |
申请公布日期 |
2006.04.26 |
申请号 |
EP20040776906 |
申请日期 |
2004.06.22 |
申请人 |
CORNING INCORPORATED |
发明人 |
COUILLARD, JAMES G;HANCOCK, ROBERT R. JR.;LEWIS, MARK A |
分类号 |
C03C17/34;C03C17/42;C23C16/02;C30B25/02;C30B25/18;H01L21/20;H01L21/205;(IPC1-7):H01L21/20 |
主分类号 |
C03C17/34 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|