| 发明名称 |
Lithographic apparatus, alignment method and device manufacturing method |
| 摘要 |
To align between layers having a large Z separation, e.g. in the manufacture of MEMS or MOEMS, an alignment system which illuminates reference markers with normally incident radiation is used. The alignment system has an illumination system that is telecentric on the substrate side. <IMAGE> |
| 申请公布号 |
SG120912(A1) |
申请公布日期 |
2006.04.26 |
| 申请号 |
SG20030000549 |
申请日期 |
2003.02.13 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BEST KEITH;FRIZ ALEX;CONSOLINI JOE;BUEL VAN HENRICUS WILHELMUS MARIA;GUI CHENG-QUN |
| 分类号 |
G01B11/00;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G03F9/00 |
主分类号 |
G01B11/00 |
| 代理机构 |
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代理人 |
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| 地址 |
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