发明名称 Coating composition for use in producing an insulating thin film
摘要 <p>Disclosed is a coating composition for use in producing an insulating thin film, comprising:(A) at least one silica precursor comprised of at least one compound selected from the group consisting of an alkoxysilane and a hydrolysis product thereof;(B) at least one organic polymer;(C) water;(D) at least one alcohol; and optionally(E) an organic solvent for a mixture of the components (A), (B), (C) and (D);wherein the weight ratio (WR) of the water (C) to the at least one silica precursor (A) satisfies the formula 0.01<WR<10, and the weight of the water (C) is larger than that of the at least one alcohol (D),with the proviso that when the at least one organic polymer (B) is insoluble in a mixture of the water (C) and the alcohol (D), the coating composition comprises all of the components (A) to (E).</p>
申请公布号 HK1054762(A1) 申请公布日期 2006.04.21
申请号 HK20030106938 申请日期 2003.09.26
申请人 ASAHI KASEI KABUSHIKI KAISHA 发明人 HIROYUKI HANAHATA;TORU ARAKI;MIKIHIKO NAKAMURA
分类号 C09D5/25;C09D183/04;C09D183/14;H01L21/312;H01L21/316;(IPC1-7):C09D;C01B;H01L 主分类号 C09D5/25
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