| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum film formation apparatus using a pressure gradient ion plating capable of stably forming a film. SOLUTION: The vacuum film formation apparatus comprises a pressure gradient hollow cathode type ion plating film formation section provided on the side of a film formation chamber inside a vacuum chamber; a substrate convey chamber separated from the film formation chamber with respect to pressure; an ion plating film formation section provided with a short pipe projecting from the vacuum chamber on the side of the film formation chamber toward the exit of a pressure-gradient plasma gun; and a converging coil surrounding the short pipe and contracting the cross-sectional area of a plasma beam from the pressure-gradient plasma gun. The vacuum film formation apparatus forms a thin film over the entire surface of a substrate in the film formation region in an electrically insulated film formation drum by leading the plasma beam to the surface of an evaporation material placed in the film formation chamber, wherein an electron return electrode that surrounds the periphery of the plasma beam and returns electrically floating electrons is provided within the short pipe. COPYRIGHT: (C)2006,JPO&NCIPI
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