| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a functional film which can sufficiently secure desired film characteristics such as a high planarity of the film surface and a high denseness of the film regardless of the baking temperature, that is, even if the baking temperature is set low. SOLUTION: The method of manufacturing the functional film comprises a process of placing, on a substrate P, a first ink containing a metal or metal oxide material which has a melting point of 900°C or above, and has a melting point of 55°C when the grain diameter is 30-150 nm as a solute; and a process of placing a second ink X2 containing metal organic salt as a solute on the first ink. COPYRIGHT: (C)2006,JPO&NCIPI |
