| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum ultraviolet light irradiation device having a simple structure with which a sample can be washed by vacuum ultraviolet light irradiation without requiring a long time for gas replacement. SOLUTION: The vacuum ultraviolet light irradiation device is provided with a vacuum ultraviolet light generation chamber A wherein a discharge electrode 16 is disposed for generating vacuum ultraviolet light, a gas inflow path 19a into which gas for vacuum ultraviolet light generation is caused to flow, a gas outflow path A1a from which the gas for vacuum ultraviolet light generation (which had been caused to flow into) is caused to flow out from the vacuum ultraviolet light generation chamber A, and a sample support member 21 for supporting a sample at a position to be irradiated with vacuum ultraviolet light within the vacuum ultraviolet light generation chamber A and in the gas paths for vacuum ultraviolet light generation. COPYRIGHT: (C)2006,JPO&NCIPI
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