| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device that stabilizes the wafer temperature during exposure and shortens the time required for wafer transportation and an exposure method it employs. SOLUTION: Because a board holder storing multiple above-mentioned boards is placed in a decompressed atmosphere so that the target board can be selected from the board holder for exposure, wafer temperature can be stabilized and set with high precision during exposure. COPYRIGHT: (C)2006,JPO&NCIPI
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