| 摘要 |
PROBLEM TO BE SOLVED: To improve the accuracy of uneveness inspection near edges, in the uneveness inspection for inspecting the density uneveness of an object of interest. SOLUTION: In this uneveness inspection device 1 for inspecting density uneveness of a resist applied onto a substrate 9, low-pass filter processing is performed after an imaged image of the substrate 9 is compressed, and then high-pass filter processing is performed by a high-pass filter part 4214. In the high-pass filter part 4214, when a high-pass window exists near an edge, the high-pass window is reduced, and a region other than the region to which a noted pixel as an object for pixel value calculation by filter processing belongs, is avoided. In the uneveness inspection device 1, by restricting the pixel group used for the high-pass filter processing to the pixels in the high-pass window, namely, pixels inside the region to which the target pixel substantially belongs, accuracy of uneveness inspection near the edge is improved. COPYRIGHT: (C)2006,JPO&NCIPI
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