| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing alkylsulfonyloxy-substituted adamantyl(meth)acrylates being adamantane derivatives, which are useful as the monomers for a functional resin such as photosensitive resin in photolithography field, in a good yield without a problem in handling and the like. SOLUTION: An adamantane compound to be a raw material for the adamantane derivative is reacted with a sulfonyl compound in an organic solvent of which the dielectric constant at 20°C is 8 or lower. COPYRIGHT: (C)2006,JPO&NCIPI
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