发明名称 Semiconductor memory devices including electrode contact structures having reduced contact resistance and methods of fabricating the same
摘要 A semiconductor memory device includes a semiconductor substrate having an active region therein, an insulating layer on the substrate, and a lower electrode conductive pad extending through the insulating layer. The lower electrode conductive pad electrically contacts the active region at a lower surface of the lower electrode conductive pad. A lower electrode conductive plug on at least a portion of the lower electrode conductive pad electrically contacts the lower electrode conductive pad at an upper surface and at one sidewall thereof. The semiconductor device may further include a bitline conductor on the substrate adjacent the lower electrode conductive plug and an insulating spacer on a sidewall of the bitline conductor adjacent the lower electrode conductive plug. The insulating spacer may separate the lower electrode conductive plug from the bitline conductor by a distance sufficient to prevent electrical contact therebetween. Related methods are also discussed.
申请公布号 US2006081913(A1) 申请公布日期 2006.04.20
申请号 US20050185559 申请日期 2005.07.20
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM SI-YOUN
分类号 H01L29/788 主分类号 H01L29/788
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