| 摘要 |
PROBLEM TO BE SOLVED: To efficiently suppress-dimensional fluctuations caused by resist heating without waste and maintaining high accuracy and high throughput. SOLUTION: The charged particle beam lithography device is provided with a deflector 14 for varying beam dimension, which forms a variable-forming beam, by controlling the shape and the dimension of a charged beam emitted from a charged beam source 6, a pattern data decoder 23 for dividing a pattern to be drawn on the resist on a sample 2 into a plurality of shot figures which can be formed with the deflector 14 for varying a beam dimension, an area recognizing unit 30 for detecting an area for each shot figure, and a drawing data corrector 31 which reconstructs each shot figure so that the area to be detected for each shot figure approximates the preset maximum area. COPYRIGHT: (C)2006,JPO&NCIPI
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