发明名称 Method for temperature control in a rapid thermal processing system
摘要 A method is disclosed for a multi-zone interference correction processing for a rapid thermal processing (RTP) system. This processing allows for improved calibration/tuning of RTP systems by accounting for zone coupling. The disclosed method includes establishing baseline characteristic data and zone characteristic data, and then using the baseline and zone characteristic data to determine lamp-control parameters, such as temperature offset values, for temperature sensors of the RTP system. The baseline characteristic data includes information regarding baseline heating uniformity of an RTP system. The zone characteristic data is collected for a plurality of heating zones within the heating chamber of the RTP system, each zone being associated with a respective temperature probe. The zone characteristic data is collected based on controlled temperature sensor variations. The lamp-control parameters for temperature probes of the RTP system are then calculated based on the baseline characteristic data and the zone characteristic data.
申请公布号 US2006084188(A1) 申请公布日期 2006.04.20
申请号 US20040969475 申请日期 2004.10.20
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 YOU WEI-MING;WANG SHI-MING;CHEN CHENG W.;HUANG JIAN-HUA;DU YU-LIN
分类号 H01L21/66 主分类号 H01L21/66
代理机构 代理人
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