发明名称 METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a liquid crystal display for reducing the number of photolithographic processes. <P>SOLUTION: The method includes steps of forming a gate electrode and a gate pad in a TFT area and a pad area by sequentially depositing a first metal film and a second metal film on a substrate of the TFT section and the pad area and patterning the first and second metal films by a first photolithographic process so as to gradually reduce the width of the first metal film from the bottom; forming an insulating film on the entire surface of the substrate; forming a semiconductor film on the insulating film of the TFT section using a second photolithography process; forming a source electrode and a drain electrode composed of a third metal film using a third photolithography process; forming a protective film pattern which exposes the drain electrode and the upper face of the second metal film of the gate pad, the protective film formed on the source electrode and the drain electrode and on the insulating film of the pad section using a quarternary photolithographic process; and forming a first pixel electrode pattern connected to the drain electrode and a second pixel electrode pattern connected to the second metal film of the gate pad using a quintic photolithography process. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006106788(A) 申请公布日期 2006.04.20
申请号 JP20050368671 申请日期 2005.12.21
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 LEE JUENG-GIL;LEE JUNG-HO;NAM HYO-RAK
分类号 G02F1/1343;G02F1/1345;G02F1/136;G02F1/1362;G02F1/1368;H01L21/28;H01L21/3205;H01L21/336;H01L21/768;H01L23/482;H01L23/52;H01L27/12;H01L29/423;H01L29/49;H01L29/786 主分类号 G02F1/1343
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