| 摘要 |
PROBLEM TO BE SOLVED: To provide an ion source capable of electrically selecting kinds of ions to be discharged and widely varying the depth of doping by switching a plasma generating means to one or both of dc arc discharge and a microwave. SOLUTION: A plasma chamber 11, a waveguide 21 connected to the plasma chamber 11, and extraction electrodes 31, 32 and 33 are provided, and ions from plasma P generated by one or both of the dc arc discharge and the microwave MW from the waveguide are discharged from an ion extraction port 11b as an ion beam Ib. COPYRIGHT: (C)2006,JPO&NCIPI
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