发明名称 ANALYZING METHOD ACCOMPANIED BY INCIDENCE OF BEAM
摘要 PROBLEM TO BE SOLVED: To ensure an analysis with high precision even in the case of a sample having a region low in flatness on an analyzing surface in an analyzing method accompanied by the incidence of a beam such as an X-ray reflectivity method or the like. SOLUTION: The most flat region of the analyzing surface of the sample 3 is selected to adjust the position of the sample 3 so that the beam enters the selected region at a predetermined angle. In the case of Fig., the beam is allowed to enter a region E but not a region D. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006105748(A) 申请公布日期 2006.04.20
申请号 JP20040292043 申请日期 2004.10.05
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY 发明人 FUJIMOTO TOSHIYUKI;TAKATSUJI TOSHIYUKI;AZUMA YASUSHI;OSAWA TAKAMITSU
分类号 G01N23/207;G01B11/24 主分类号 G01N23/207
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