发明名称 |
ANALYZING METHOD ACCOMPANIED BY INCIDENCE OF BEAM |
摘要 |
PROBLEM TO BE SOLVED: To ensure an analysis with high precision even in the case of a sample having a region low in flatness on an analyzing surface in an analyzing method accompanied by the incidence of a beam such as an X-ray reflectivity method or the like. SOLUTION: The most flat region of the analyzing surface of the sample 3 is selected to adjust the position of the sample 3 so that the beam enters the selected region at a predetermined angle. In the case of Fig., the beam is allowed to enter a region E but not a region D. COPYRIGHT: (C)2006,JPO&NCIPI
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申请公布号 |
JP2006105748(A) |
申请公布日期 |
2006.04.20 |
申请号 |
JP20040292043 |
申请日期 |
2004.10.05 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY |
发明人 |
FUJIMOTO TOSHIYUKI;TAKATSUJI TOSHIYUKI;AZUMA YASUSHI;OSAWA TAKAMITSU |
分类号 |
G01N23/207;G01B11/24 |
主分类号 |
G01N23/207 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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