发明名称 |
High uniformity 1-D multiple magnet magnetron source |
摘要 |
A plasma sputter reactor includes a vacuum chamber; a pedestal for supporting a substrate in said vacuum chamber; a sputtering target positioned in opposition to said pedestal; and a magnetron positioned on a side of said target opposite said sputtering target, the magnetron having magnets providing a race-track beam.
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申请公布号 |
US2006081466(A1) |
申请公布日期 |
2006.04.20 |
申请号 |
US20040966383 |
申请日期 |
2004.10.15 |
申请人 |
NAGASHIMA MAKOTO;SCHMIDT DOMINIK |
发明人 |
NAGASHIMA MAKOTO;SCHMIDT DOMINIK |
分类号 |
C23C14/32;C23C14/00 |
主分类号 |
C23C14/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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