发明名称 |
Poly-silicon stringer fuse |
摘要 |
A polysilicon silicide stringer fuse is constructed having a narrow width by using an overlay tolerance of the photo stepper tool instead of the minimum critical dimension tolerance of the stepper tool. In an example embodiment, a fuse ( 200 ) for integration within a semiconductor comprises depositing an insulating layer ( 205 ) adjacent to the semiconductor substrate ( 203 ). A silicon layer ( 201 ) is formed with a first silicon material having a first resistance deposited adjacent the insulating layer ( 205 ). The silicon layer has a first width. A metal silicide stringer ( 202 ), having a second resistance different from the first resistance is deposited over a portion of the first silicon material ( 201 ) and having a second width that is less than the first width within at least a portion thereof. The metal silicide conducts current therethrough with approximately the second resistance and agglomerates in response to a programming current other than the conduct current therethrough with a same second resistance.
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申请公布号 |
US2006081959(A1) |
申请公布日期 |
2006.04.20 |
申请号 |
US20050537953 |
申请日期 |
2005.12.19 |
申请人 |
KONINKLIJKE PHILIPS ELECTRONIC N.V. |
发明人 |
DONDERO RICHARD;TROTTER DOUG |
分类号 |
H01L29/00;H01L21/331;H01L23/525 |
主分类号 |
H01L29/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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