| 摘要 |
PROBLEM TO BE SOLVED: To provide a solid-state image pickup device that can suppress uneven sensitivity because the reflectivity of incident light on the surface of a light shielding film is uniform, and, in addition, that can make picture elements finer because the thickness of the light shielding film can be reduced, and to provide a method of manufacturing the device. SOLUTION: The flattened film formed on the light shielding film 7 is constituted of a first flattened film 9 formed at a temperature lower than the oxidizing temperature of the light shielding film 7, and a second flattened film 10 formed at a temperature higher than the forming temperature of the first flattened film 9. Consequently, the solid-state image pickup device which is suppressed in uneven sensitivity can be realized because the scattering rate of incident light on the surface of the light shielding film 7 can be maintained uniformly at all picture elements. Since the surface of the light shielding film 7 is not oxidized, in addition, the thickness of the film 7 can be reduced and the picture elements can be made finer. Moreover, when the second flattened film 10 is formed at a temperature higher than the oxidizing temperature of the light shielding film 7, the productivity of the solid-state image pickup device can be improved. COPYRIGHT: (C)2006,JPO&NCIPI
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