发明名称 Semiconductor device having fin transistor and planar transistor and associated methods of manufacture
摘要 Disclosed is a fin transistor and a planar transistor and a method of forming the same. The fin transistor and the planar transistor are formed to have gate electrodes with similar thicknesses by selectively recessing a semiconductor substrate in a planar region where the planar transistor is formed.
申请公布号 US2006081895(A1) 申请公布日期 2006.04.20
申请号 US20050244136 申请日期 2005.10.06
申请人 LEE DEOK-HUYNG;SHIN YU-GYUN;LEE JONG-WOOK;KANG MIN-GU 发明人 LEE DEOK-HUYNG;SHIN YU-GYUN;LEE JONG-WOOK;KANG MIN-GU
分类号 H01L29/76 主分类号 H01L29/76
代理机构 代理人
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