发明名称 PRODUCTION OF POLYMER-COATED PARTICLE FOR CHEMICAL MECHANICAL POLISHING
摘要 <p><P>PROBLEM TO BE SOLVED: To produce a polymer-coated particles useful for carrying out chemical mechanical polishing of magnetic, optical, semiconductor or silicon substrates. <P>SOLUTION: At first, a dispersion of particle cores in a non-aqueous solvent is prepared. Then, a polymeric precursor is introduced into the dispersion and the polymeric precursor is reacted with the dispersion to form a polymer. At least a portion of the surface of the particle cores is coated with the polymer to form the polymer-coated particles having a solid outer polymeric shell. A non-aqueous solvent is substituted with water to form an aqueous mixture containing the polymer-coated particles. Then, an aqueous chemical mechanical polishing formulation is formed by using the polymer-coated particles without drying the polymer-coated particles. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006104443(A) 申请公布日期 2006.04.20
申请号 JP20050220381 申请日期 2005.07.29
申请人 ROHM & HAAS ELECTRONIC MATERIALS CMP HOLDINGS INC 发明人 WANG HONGYU;QUANCI JOHN;PARTCH RICHARD E;BARNEY NATHANIEL A
分类号 C08F2/44;B24B37/00;C09K3/14;H01L21/304 主分类号 C08F2/44
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