发明名称 SUBSTRATE SUPPORTING METHOD AND SUBSTRATE SUPPORTING DEVICE IN DEPOSITED FILM PRODUCTION APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a substrate supporting method, in a deposited film production apparatus of a roll to roll system, where, while the grounding potential of a substrate is secured, and the distortion of the substrate is corrected, collision marks, flaws, or the like, are not generated. <P>SOLUTION: A face on the side at which a deposited film is not formed in the substrate 100 is attracted with a magnet 112, thus the substrate 100 is closely stuck to a top plate 111<SB>1</SB>in an internal vessel provided inside an external vessel capable evacuation and is supported. The magnet 112 is composed of a plurality of magnets arranged in such a manner that the N pole in either magnet and the S pole in the other magnet are alternately made adjacent, and they are arranged in such a manner that the direction of the boundary 113 between the N pole and the S pole and the carrying direction of the substrate are not made vertical. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006104548(A) 申请公布日期 2006.04.20
申请号 JP20040295788 申请日期 2004.10.08
申请人 CANON INC 发明人 SHISHIDO KENJI
分类号 C23C16/54;C23C16/24;C23C16/44;H01L31/04 主分类号 C23C16/54
代理机构 代理人
主权项
地址