| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus which improves the quality of a thin film formed by vapor deposition, and increases an operating efficiency of the apparatus. SOLUTION: This vapor deposition apparatus has a shutter 12 which has an emission hole 11d for emitting an evaporated material formed therein, and intercepts or opens a flight pathway X of the evaporated material moving toward a glass substrate 1 through the emission hole 11d, and a scraper 17 for scraping a vapor-deposited substance 16 which has deposited on the shutter 12, arranged in a vessel 3 for vapor-depositing the evaporated material onto the glass substrate 1 placed therein. The vapor-deposited substance 16 is scraped off by the scraper 17 at every time the winding-up number of a shutter-winding-up member 14 reaches a predetermined number, so that the vapor deposition apparatus prevents the vapor-deposited substance 16 from falling in a series of film-forming steps, and accordingly improves the quality of the thin film formed by vapor deposition. COPYRIGHT: (C)2006,JPO&NCIPI
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